Method for detoxifying HCD gas and apparatus therefor
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United States of America Patent
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Jul 12, 2011
Grant Date -
Apr 23, 2009
app pub date -
Feb 6, 2007
filing date -
Mar 7, 2006
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Abstract
Hexachlorodisilane is decomposed into hydrochloric acid, silicon dioxide and water by introducing hexachlorodisilane-containing flue gas into a reaction region without moistening the flue gas and by supplying oxygen-containing gas that also contains a small amount of moisture to the reaction region maintained at a temperature at which hexachlorodisilane decomposes.
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