Plasma generation apparatus and work processing apparatus
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United States of America Patent
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Jul 12, 2011
Grant Date -
Aug 23, 2007
app pub date -
Feb 13, 2007
filing date -
Feb 17, 2006
priority date (Note) -
Expired
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Abstract
A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
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