High resolution wafer inspection system
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United States of America Patent
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Jul 5, 2011
Grant Date -
Jul 29, 2010
app pub date -
Apr 1, 2010
filing date -
Dec 6, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for inspecting a region, including irradiating the region via an optical system with a pump beam at a pump wavelength. A probe beam at a probe wavelength irradiates the region so as to generate returning probe beam radiation from the region. The beams are scanned across the region at a scan rate. A detector receives the returning probe radiation, and forms an image of the region that corresponds to a resolution better than pump and probe Abbe limits of the optical system. Roles of the pump and probe beams may be alternated, and a modulation frequency of the pump beam may be changed, to produce more information. Information extracted from the probe signal can also differentiate between different materials on the region.
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