Method for imprint lithography at constant temperature
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United States of America Patent
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Jul 5, 2011
Grant Date -
Jul 19, 2007
app pub date -
Nov 25, 2004
filing date -
May 7, 2004
priority date (Note) -
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Abstract
Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature T.sub.p by means of a heater device (20); and while maintaining said temperature T.sub.p, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and--postbaking the layer.
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