Electrochemical removal of tantalum-containing materials
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United States of America Patent
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Jun 21, 2011
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app pub date -
Jun 17, 2004
filing date -
Nov 25, 2002
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Abstract
A method of cleaning metal-containing deposits from a metal surface of a process chamber component includes immersing the metal surface in an electrochemical cleaning bath solution. A negative electrical bias is applied to the metal surface to electrochemically clean the metal-containing deposits from the metal surface. The cleaning method is capable of removing metal-containing deposits such as tantalum-containing deposits from the metal surface substantially without eroding the surface, and may be especially advantageous in the cleaning of components having textured surfaces.
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