Cleaning of plasma chamber walls using noble gas cleaning step
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United States of America Patent
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Jun 21, 2011
Grant Date -
Mar 12, 2009
app pub date -
Sep 5, 2008
filing date -
Sep 7, 2007
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Expired
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Abstract
An improved reaction chamber cleaning process is provided for removing water residues that makes use of noble-gas plasma reactions. The method is easy applicable and may be combined with standard cleaning procedure. A noble-gas plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules to form electronically excited oxygen atoms is used to remove the adsorbed water.
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