Method of IC design optimization via creation of design-specific cells from post-layout patterns

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United States of America Patent

PATENT NO 7941776
APP PUB NO 20080127000A1
SERIAL NO

11805947

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A closed-loop IC design optimization process by automatically or manually creating design-specific cells with desired characteristics (e.g., performance, area, power, noise, etc.), which will be then implemented as a standard cell (also known hereafter as metacell), from a set of post-layout patterns. A post-layout pattern represents a part or whole of a standard cell and contains information regarding the pattern including, but not limited to, layout, timing, area, power and noise. As the metacells are created from post-layout patterns, the inaccuracies of prior dynamic library techniques are easily avoided. Such metacells, being design-specific, are optimized to satisfy the constraints imposed by the design context, thus bringing the powerful design-specific customization to standard cell-based design methodology.

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ALPHAWAVE SEMI INC490 N MCCARTHY BLVD SUITE 220 MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boppana, Vamsi San Jose, US 8 637
Chavda, Pramit Anikumar Fremont, US 1 268
Kojima, Yoshihisa Kawasaki, JP 164 1268
Kumthekar, Balakrishna Santa Rosa, US 1 268
Majumder, Purnabha Sunnyvale, US 2 269
Mowchenko, John Pleasanton, US 1 268
Shah, Nimish Rameshbhai Cupertino, US 4 280
Yoshida, Hiroaki Tokyo, JP 263 3952

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