X-ray condensing method and its device using phase restoration method
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United States of America Patent
Stats
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May 3, 2011
Grant Date -
Jul 22, 2010
app pub date -
Dec 27, 2007
filing date -
Dec 28, 2006
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.
First Claim
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Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
JP | B2 | JP4814782 | Dec 28, 2006 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PUBLISHED GRANTED PATENT (SECOND LEVEL) | X-RAY CONDENSING METHOD USING PHASE RECOVERY METHOD, AND DEVICE THEREOF | Nov 16, 2011 | |||
WO | A1 | WO2008081873 | Dec 27, 2007 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT | 位相回復法を用いたX線集光方法及びその装置 | Jul 10, 2008 | |||
EP | B1 | EP2063434 | Dec 27, 2007 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
Patent | X-RAY CONDENSING METHOD AND ITS DEVICE USING PHASE RESTORATION METHOD | Mar 28, 2012 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
OSAKA UNIVERSITY | SUITA-SHI OSAKA 565-0871 | |
JTEC CORPORATION | 2-5-38 SAITOYAMABUKI IBARAKI-SHI OSAKA 5670086 ?5670086 |
International Classification(s)

- 2007 Application Filing Year
- G21K Class
- 462 Applications Filed
- 181 Patents Issued To-Date
- 39.18 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Mimura, Hidekazu | Suita, JP | 8 | 4 |
# of filed Patents : 8 Total Citations : 4 | |||
Okada, Hiromi | Kobe, JP | 21 | 99 |
# of filed Patents : 21 Total Citations : 99 | |||
Yamauchi, Kazuto | Suita, JP | 33 | 238 |
# of filed Patents : 33 Total Citations : 238 |
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- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- 14 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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