Method of forming light-emitting device using nitride bulk single crystal layer

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United States of America Patent

PATENT NO 7935550
APP PUB NO 20080108162A1
SERIAL NO

11969735

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Abstract

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The object of this invention is to provide a high-output type nitride light emitting device.or less, and A-plane or M-plane which is parallel to C-axis of hexagonal structure for an epitaxial face, wherein the n-type semiconductor layer or layers are formed directly on the A-plane or M-plane.N (0≦x≦1) can be formed at a low temperature not causing damage to the active layer.

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Patent OwnerAddress
AMMONO SP Z O O00-377 WARSAW

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Doradzinski, Roman Warsaw, PL 24 951
Dwilinski, Robert Warsaw, PL 23 956
Garczynski, Jerzy Lomianki, PL 28 1305
Kanbara, Yasuo Anan, JP 28 1468
Sierzputowski, Leszek Union City, US 16 685

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