Acid-amplifier having acetal group and photoresist composition including the same
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United States of America Patent
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May 3, 2011
Grant Date -
Jan 22, 2009
app pub date -
Jul 17, 2008
filing date -
Jul 20, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1.saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).
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