Imprinting of partial fields at the edge of the wafer
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 3, 2011
Grant Date -
Nov 19, 2009
app pub date -
Jun 5, 2009
filing date -
Apr 3, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully