Electron beam applying apparatus and drawing apparatus
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United States of America Patent
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Apr 19, 2011
Grant Date -
Jul 16, 2009
app pub date -
Feb 19, 2009
filing date -
Jul 22, 2004
priority date (Note) -
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status (Latency Note)
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Abstract
An electron beam applying apparatus includes: a thermal field emission type electron source emitting an electron beam; an electrostatic lens disposed immediately below the electron source and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens and condensing the electron beam condensed in the second aperture angel by the electrostatic lens in a crossover point; and an objective lens disposed on a downstream side of the condenser lens and condensing the electron beam condensed in the crossover point by the condenser lens on the surface of the material.
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