Electron gun, electron beam exposure apparatus, and exposure method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 5, 2011
Grant Date -
Dec 25, 2008
app pub date -
May 7, 2008
filing date -
Nov 8, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB.sub.6) or cerium hexaboride (CeB.sub.6). The electron emission restrictive region may be covered with carbon.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully