Illumination system for microlithography
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United States of America Patent
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Mar 22, 2011
Grant Date -
Mar 15, 2007
app pub date -
Apr 13, 2004
filing date -
Jul 30, 2003
priority date (Note) -
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Abstract
The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity,characterized in thata filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
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