Method for focusing electron beam in electron column
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United States of America Patent
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Mar 8, 2011
Grant Date -
Aug 13, 2009
app pub date -
Dec 5, 2006
filing date -
Dec 5, 2005
priority date (Note) -
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Abstract
The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.
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