Shower plate, plasma processing apparatus, and product manufacturing method
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United States of America Patent
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Feb 1, 2011
Grant Date -
Jun 28, 2007
app pub date -
Sep 24, 2004
filing date -
Dec 26, 2003
priority date (Note) -
Expired
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Abstract
A system for processing a substrate uniformly by increasing the number of gas discharge holes being arranged per unit area of a shower plate as receding from the center of the shower plate or increasing the radii of the gas discharge holes as receding from the center of the shower plate thereby making the plasma excitation gas flow uniform.
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