Method for extending equipment uptime in ion implantation
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United States of America Patent
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Jan 25, 2011
Grant Date -
Mar 26, 2009
app pub date -
Sep 19, 2008
filing date -
Sep 21, 2007
priority date (Note) -
Expired
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Abstract
The invention features in-situ cleaning process for an ion source and associated extraction electrodes and similar components of the ion-beam producing system, which chemically removes carbon deposits, increasing service lifetime and performance, without the need to disassemble the system. In particular, an aspect of the invention is directed to an activating, catalytic, or reaction promoting species added to the reactive species to effectively convert the non-volatile molecular residue into a volatile species which can be removed by conventional means.
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