Apparatus and process for producing thin films and devices
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United States of America Patent
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Jan 18, 2011
Grant Date -
Jun 5, 2008
app pub date -
Mar 3, 2005
filing date -
Mar 12, 2004
priority date (Note) -
Expired
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Abstract
A silicon nitride thin film formation apparatus is provided for stationary and moving substrates and a process for forming such films. The process provides high uniformity of film thickness and film properties as well as a high deposition rate. The film properties are adequate for application as an antireflection layer or passivation layer in solar cell devices or as dielectric layer in thin film transistors. The apparatus includes a number of metal filaments. In the space within the formation apparatus opposite to the substrate with respect to the filaments, a gas dosage system is arranged at a predetermined distance of the filaments. The film formation apparatus for stationary substrates also contains a shutter to control the starting and ending conditions for film formation and to control the film thickness.
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