Transfer mask for exposure and pattern exchanging method of the same
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United States of America Patent
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Jan 4, 2011
Grant Date -
Jun 2, 2005
app pub date -
Jan 10, 2005
filing date -
Jul 11, 2002
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the plurality of cells is exposed to a charged particle beam, each of the plurality of cells is adapted to make the charged particle beam pass through itself to the other side thereof based on the pattern of the opening formed in the cell. Thus, when a substrate to be processed is arranged on the other side of the cell, the pattern of the opening formed in the cell is transferred to the substrate to be processed and hence an exposure pattern is formed on the substrate to be processed. The feature of the present invention is that a part of or all the plurality of cells can be exchanged at the mask portion.
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