Low frequency process-variation-insensitive temperature-stable micromechanical resonators
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United States of America Patent
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Dec 28, 2010
Grant Date -
Aug 7, 2008
app pub date -
Dec 13, 2007
filing date -
Dec 13, 2006
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Abstract
Disclosed are micromechanical resonators having features that compensate for process variations and provide improved inherent temperature stability. Exemplary resonators may comprise comb drive resonators or parallel-plate drive resonators. The resonators comprise a (silicon-on-insulator) substrate with resonator apparatus formed therein. The resonator apparatus has one or more anchors connected to the substrate, at least one excitation/sense port that is electrically insulated from the substrate, and a resonator. The resonator comprises one or more flexural members connected to the one or more anchors that are separated from the substrate and separated from the excitation/sense port by gaps. A mass is coupled to flexural members, is separated from the substrate, and comprises a grid. Process compensation is achieved using a resonator mass in the form of a grid of lines that form holes or lines through the mass, wherein widths of lines of the grid are approximately 1/3 the width of the flexural members. Temperature stability is provided using silicon dioxide on at least one of the surfaces of the flexural members.
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