Method and device for fabricating nano-structure with patterned particle beam
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United States of America Patent
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Nov 23, 2010
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Jun 25, 2007
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Jul 18, 2006
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Abstract
The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure the method is more simplified and easy to be achieved.
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