Process of imaging a photoresist with multiple antireflective coatings
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United States of America Patent
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Oct 19, 2010
Grant Date -
Aug 10, 2006
app pub date -
Jan 24, 2006
filing date -
Feb 10, 2005
priority date (Note) -
Expired
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Abstract
A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.
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