Polishing pad, the use thereof and the method for manufacturing the same
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United States of America Patent
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Oct 19, 2010
Grant Date -
Dec 4, 2008
app pub date -
May 29, 2007
filing date -
May 29, 2007
priority date (Note) -
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Abstract
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
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