Imprinting apparatus and method for forming residual film on a substrate
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United States of America Patent
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Oct 5, 2010
Grant Date -
Feb 7, 2008
app pub date -
Aug 1, 2007
filing date -
Aug 1, 2006
priority date (Note) -
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Abstract
An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.
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