Plasma treatment apparatus
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United States of America Patent
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Oct 5, 2010
Issued Date -
N/A
app pub date -
Dec 7, 2006
filing date -
Aug 9, 2002
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Abstract
A plasma CVD apparatus has a container, and channels composed of introduction grooves and circumferential grooves for different types of gases are formed within the container. The gases introduced through source gas piping, auxiliary gas piping, and cleaning gas piping are equally supplied to a plurality of supply nozzles, a plurality of auxiliary gas supply nozzles, and a plurality of cleaning gas nozzles. The configuration of the container can be simplified without complicating pipings for the gases.
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