Condensation type polymer-containing anti-reflective coating for semiconductor
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United States of America Patent
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Sep 7, 2010
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app pub date -
Apr 6, 2005
filing date -
Apr 9, 2004
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Abstract
There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.
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