Micromachined gas and liquid concentration sensor and method of making the same

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United States of America Patent

PATENT NO 7780343
SERIAL NO

11774771

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Abstract

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A device with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon sensor to measure gas or liquid concentration in a binary mixture formality is disclosed in the present invention. A process for fabricating the said MEMS silicon concentration sensor, which thereby can greatly reduce the sensor fabrication cost by a batch production, is revealed as well. This MEMS process can mass-produce the sensors on silicon substrate in the ways of small size, low power, and high reliability. In addition to the gas or liquid concentration measurement, the present invention further discloses that the said sensor can also readily measure gas or liquid mass flow rate while record the concentration data, which is not viable by other related working principle.

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Patent Owner(s)

Patent OwnerAddress
SIARGO (SHANGHAI) LTDBUILDING 4 1 2ND SOUTH SCIENCE PARK RD CHENGDU 610041

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chih-Chang Cupertino, US 92 707
Huang, Liji San Jose, US 59 723
Wang, Gaofeng San Jose, US 32 194
Yao, Yahong Milpitas, US 12 168

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