Ion implanting apparatus and method of correcting beam orbit

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United States of America Patent

PATENT NO 7772573
APP PUB NO 20090302214A1
SERIAL NO

12476836

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Abstract

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An extraction electrode of an ion source is dividedly configured by a first extraction electrode and a second extraction electrode. DC power supplies which form a potential difference between the electrodes, a camera which takes an image of the ion beam to output image data of the ion beam, and a rear-stage beam instrument which measures the beam current of the ion beam that has passed through the analysis slit are disposed. A step of adjusting an analysis electromagnet current so that the beam current measured by the rear-stage beam instrument is maximum, that of processing the image data from the camera to obtain the deviation angle of the ion beam entering the analysis slit from the design beam orbit, and that of, if the deviation angle is not within an allowable range, adjusting the potential difference between the electrodes so that the ion beam is bent to a direction where the deviation angle becomes small, by the potential difference are performed one or more times until the deviation angle is within the allowable range.

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Patent Owner(s)

Patent OwnerAddress
NISSIN ION EQUIPMENT CO LTD575 KUZE-TONOSHIRO-CHO MINAMI-KU KYOTO-SHI KYOTO 601-8205

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Igo, Tetsuya Kyoto, JP 7 75
Ikejiri, Tadashi Kyoto, JP 10 121
Yamashita, Takatoshi Kyoto, JP 24 208

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