Electron beam irradiation method, electron beam irradiation apparatus, and electron beam irradiation apparatus for open-mouthed container

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United States of America Patent

PATENT NO 7767987
APP PUB NO 20090134338A1
SERIAL NO

12065681

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Abstract

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There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.

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Patent Owner(s)

Patent OwnerAddress
JAPAN AE POWER SYSTEMS CORPORATIONMINATO-KU TOKYO 105-0003

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eguchi, Shiro Chiba, JP 4 31
Fujita, Hiroyuki Hitachi-Ohta, JP 290 3516
Gozaki, Satoru Ichihara, JP 1 21
Hashimoto, Isao Hitachi, JP 59 517
Hashimoto, Nobuyuki Ichihara, JP 65 800
Hikosaka, Tomoyuki Ichihara, JP 4 31
Koide, Hidenobu Ichihara, JP 5 53
Okamoto, Yukio Kisarazu, JP 54 779
Sato, Shigekatsu Hitachi, JP 7 38
Suzuki, Takayuki Kisarazu, JP 661 11733

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