Polishing pad and cushion layer for polishing pad

United States of America Patent

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Jul 27, 2010
Grant Date
Jul 6, 2006
app pub date
Mar 2, 2006
filing date
Dec 1, 2000

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Abstract

A polishing pad includes a polishing layer having abrasive grains dispersed in a resin and is characterized in that the resin is a resin containing ionic groups in the range of 20 to 1500 eq/ton.

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Patent Owner(s)

Patent Owner	Address
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC	451 BELLEVUE ROAD NEWARK DE 19713

International Classification(s)

B24D:TOOLS FOR GRINDING, BUFFING, OR SHARPENING

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[Patents Count]

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Inventor Name	Address	# of filed Patents	Total Citations
Komai, Shigeru	Ohtsu, JP	11	543
Nakamori, Masahiko	Ohtsu, JP	28	623
Ono, Koichi	Ohtsu, JP	140	1559
Shimomura, Tetsuo	Ohtsu, JP	29	762
Tsutsumi, Masayuki	Ohtsu, JP	17	419
Yamada, Takatoshi	Ohtsu, JP	40	697

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Polishing pad and cushion layer for polishing pad

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11366981

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PATENT NO	7762870
APP PUB NO	20060148393A1
SERIAL NO	11366981
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
July 27, 2010	US,7762870,B2 US7762870B2	GRANTED PATENT AS SECOND PUBLICATION
July 06, 2006	US,20060148393,A1 US20060148393A1	FIRST PUBLISHED PATENT APPLICATION

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11366981

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