Method of fabricating active layer of thin film transistor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 29, 2010
Grant Date -
Mar 6, 2008
app pub date -
Dec 22, 2006
filing date -
Sep 4, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A manufacturing method of an active layer of a thin film transistor is provided. The method includes following steps. First a substrate is provided, and a semiconductor precursor solution is then prepared through a liquid process. Thereafter, the semiconductor precursor solution is provided on the substrate to form a semiconductor precursor thin film. After that, a light source is used to irradiate the semiconductor precursor thin film to remove residual solvent and allow the semiconductor precursor thin film to produce semiconductor property, so as to form a semiconductor active layer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully