Apparatus and method for focused electric field enhanced plasma-based ion implantation
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United States of America Patent
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Jun 22, 2010
Grant Date -
Jan 19, 2006
app pub date -
Jul 14, 2004
filing date -
Jul 14, 2004
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Abstract
There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
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