Method of fabricating turning mirror using sacrificial spacer layer and device made therefrom
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United States of America Patent
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Jun 22, 2010
Grant Date -
N/A
app pub date -
May 13, 2009
filing date -
Jun 16, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention is a method of fabricating a waveguide using a sacrificial spacer layer. The first step in this process is to fabricate the underlying optical semiconductor structure. A trench is then etched in this structure resulting in an underlying L-shaped structure. A sacrificial spacer layer is deposited in the trench. The waveguide is created in the trench on the sacrificial spacer layer using a mask layer to angle the vertex of the L-shaped structure. User-defined portions of the sacrificial spacer layer are subsequently removed to create air gaps between the waveguide and the sidewalls of the trench in the optical semiconductor.
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