Thermal storage type gas treating apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7740026
APP PUB NO 20080029001A1
SERIAL NO

11630933

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A thermal storage type gas treating apparatus has a high sealing performance while achieving a simple apparatus construction. The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treated gas formed in the valve member, in an opposed and communicating relationship with supply and exhaust ports formed in a distributor, thereby successively passing gas to be treated and treated gas through a plurality of thermal storage chambers communicating at one end with a combustion chamber. The valve member is supported to be displaceable toward and away from the distributor. A valve biasing device is provided for pressing the valve body to the distributor, while being inoperative with respect to a gas chamber device.

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Patent Owner(s)

Patent OwnerAddress
TAIKISHA LTDTOKYO 160-6129

International Classification(s)

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  • 2005 Application Filing Year
  • F17C Class
  • 107 Applications Filed
  • 36 Patents Issued To-Date
  • 33.65 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20052006200720082009201020112012201320142015201620170255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Horisawa, Satoshi Tokyo, JP 4 22
Matsui, Yoshiaki Tokyo, JP 11 59
Miwa, Tomotaka Tokyo, JP 5 11
Nagata, Yuji Tokyo, JP 22 411

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Patent Citation Ranking

  • 5 Citation Count
  • F17C Class
  • 11.90 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges521105101 - 1011 - 2021 - 3031 - 4001234567891011121314151617181920212223

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