Semiconductor device and method of fabricating the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 8, 2010
Grant Date -
May 29, 2008
app pub date -
Oct 29, 2007
filing date -
Nov 27, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A semiconductor device and a fabricating method thereof are provided. The semiconductor device can include a first chip having transistors of only the NMOS type, a second chip having transistors of only the PMOS type, and an interconnection electrically connecting the first and second chips to each other. By forming NMOS and PMOS transistors on separate chips, the total number of implant photo processes can be decreased, thereby reducing the fabrication cost.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully