Structure for preventing gap formation and plasma processing equipment having the same
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United States of America Patent
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Jun 1, 2010
Grant Date -
Feb 19, 2009
app pub date -
Jan 9, 2008
filing date -
Jan 10, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Plasma processing equipment having a structure for preventing gap formation includes: a chamber inside which a plasma environment is formed; an upper electrode positioned at a upper position of the chamber; an electrostatic chuck positioned at a lower position of the electrostatic chuck, having a lower electrode and holding a wafer on a top surface thereof; a ring positioned at an outer side of the electrostatic chuck; and a gap prevention unit for isolating from the outside a space between the electrostatic chuck and the ring.
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