Beam processing system and beam processing method
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United States of America Patent
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May 18, 2010
Grant Date -
Mar 20, 2008
app pub date -
May 30, 2007
filing date -
May 30, 2006
priority date (Note) -
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Abstract
A beam processing system is for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadrupole electromagnet and a second DC quadrupole electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively.
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