System and method for matching diffraction patterns
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United States of America Patent
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May 11, 2010
Grant Date -
May 22, 2008
app pub date -
Nov 6, 2007
filing date -
Aug 6, 2002
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Abstract
A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.
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