System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7710009
APP PUB NO 20070182303A1
SERIAL NO

11650310

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.

First Claim

See full text

Other Claims data not available

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kruit, Pieter Rotterdam, NL 103 1318
Steenbrink, Stijn Willem Herman Karel Delft, NL 34 330

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 2 Citation Count
  • H01J Class
  • 4.16 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges42557203944620138683901 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0255075100125150175200225250275300325350375400425450475500525550575600

Forward Cite Landscape

Load Citation