Chemical liquid supply apparatus and a chemical liquid supply method

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United States of America Patent

PATENT NO 7708880
APP PUB NO 20040144736A1
SERIAL NO

10477933

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A buffer tank section (6) includes a liquid accumulation chamber (61) communicating with, through a liquid introduction flow path (42), a liquid tank (46) accumulation chemical liquid. A filter section (4) includes a filter inlet (41a) and a filter outlet (41b), wherein the filter inlet (41a) communicates with a liquid discharge vent (60d) of the buffer tank section (6). In a pump (11), a pump inlet (11a) is connected to the filter outlet (41b) and a pump outlet (11b) is connected to a discharge nozzle (50) through a liquid discharge flow path (47). A return flow path (48) is connected between the pump outlet (11b) and the buffer tank section (6), wherein the chemical liquid, discharged from the pump (11), is returned to the liquid accumulation chamber (61). An exhaust flow path (49) is connected to the buffer tank section (6), thereby exhausting air in the liquid accumulation chamber (61).

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Patent Owner(s)

Patent OwnerAddress
KOGANEI CORPORATIONKOGANEI-SHI TOKYO 184-8533

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yajima, Takeo Tokyo, JP 25 298

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  • 6 Citation Count
  • B01D Class
  • 6.01 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges918363161356534165433701 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +050100150200250300350400450500550600650700750800850900

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