Semiconductor substrate cleaning method and semiconductor substrate cleaning machine
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 27, 2010
Grant Date -
Aug 9, 2007
app pub date -
Feb 6, 2007
filing date -
Feb 8, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A semiconductor substrate cleaning method includes a first cleaning step of cleaning the surface of a semiconductor substrate with the use of a first brush and a second cleaning step of cleaning the surface of the semiconductor substrate with the use of a second brush after the first cleaning step. The second cleaning step is performed under a condition that suppresses recontamination of the surface of the semiconductor substrate in comparison with the first cleaning step.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully