Photo-sensitive composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 13, 2010
Grant Date -
Apr 28, 2005
app pub date -
Feb 5, 2003
filing date -
Feb 5, 2002
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The invention pertains to a photo-sensitive composition which comprises a photochemical initiator, a polyacid or a salt thereof, and a poly(3,4-alkylenedioxythiophene) wherein the alkylene moiety is —(CH2)n-, n being an integer from 1 to 3, or 1,2-cyclo-hexylene, which may optionally be substituted, characterized in that the photochemical initiator is a water-soluble polymer comprising at least two azide or diazonium groups. Preferably, the water-soluble polymer is chemically stable at pH 6 or less, more preferably at pH 2 or less.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully