Method of fabricating optical device using multiple sacrificial spacer layers
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United States of America Patent
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Mar 16, 2010
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N/A
app pub date -
Sep 6, 2006
filing date -
Sep 6, 2006
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Expired
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Abstract
The present invention is a method of fabricating an optical device using multiple sacrificial spacer layers. The first step in this process is to fabricate the underlying base structure and deposit an optical structure thereon. A facet is then created at the ends of the optical structure and alternating sacrificial and intermediate layers are fabricated on the device. A mask layer is deposited on the structure, with openings created in the layers to allow use of an etchant. User-defined portions of the spacer layers are subsequently removed with the etchant to create air gaps between the intermediate layers.
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