Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
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United States of America Patent
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Mar 16, 2010
Grant Date -
Mar 6, 2008
app pub date -
Oct 30, 2007
filing date -
Apr 11, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
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