Deposition from liquid sources
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United States of America Patent
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Mar 9, 2010
Grant Date -
Jul 19, 2007
app pub date -
Mar 29, 2007
filing date -
Sep 3, 2004
priority date (Note) -
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Abstract
A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber.
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