High internal free volume compositions for low-k dielectric and other applications

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United States of America Patent

PATENT NO 7671166
SERIAL NO

11336417

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Abstract

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The present invention provides materials, devices, and methods involving new heterocyclic, shape-persistent monomeric units with internal free volume. In some cases, materials the present invention may comprise monomers, oligomers, or polymers that incorporate a heterocyclic, shape-persistent iptycene. The present invention may provide materials having low dielectric constants and improved stability at high operating temperatures due to the electron-poor character of materials. In addition, compositions of the invention may be easily synthesized and readily modified to suit a particular application.

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Patent Owner(s)

Patent OwnerAddress
MASSACHUSETTS INSTITUTE OF TECHNOLOGY77 MASSACHUSETTS AVENUE CAMBRIDGE MA 02139

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bouffard, Jean Cambridge, US 10 46
Swager, Timothy M Newton, US 110 2052

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