Treatment for reduction of line edge roughness

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7670760
SERIAL NO

11369513

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Abstract

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A method for reducing line edge roughness (LER) in a layer of photoresist is provided. In accordance with the method, a layer of photoresist is applied to a substrate. The layer of photoresist is then patterned and annealed in an atmosphere comprising at least one gas selected from the group consisting of hydrogen, nitrogen and fluorine-containing materials. Preferably, the anneal is performed after patterning the photoresist, but either immediately after, or subsequent to, the trim.

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN XINGUODU TECHNOLOGY CO LTD17TH FLOOR JINSONG MANSION TERRA INDUSTRIAL & TRADE PARK FUTIAN SHENZHEN

International Classification(s)

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  • 2006 Application Filing Year
  • G03F Class
  • 1184 Applications Filed
  • 649 Patents Issued To-Date
  • 54.82 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances200620072008200920102011201220132014201520162017201820190255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cobb, Jonathan L Austin, US 4 38
Darlington, William D Austin, US 2 13
Fisher, Brian J Austin, US 3 10
Hall, Mark D Austin, US 192 2199
Shen, Jinmiao James Austin, US 1 7
Sheth, Vikas R Austin, US 3 9
Shroff, Mehul D Austin, US 117 1313
Vasek, James E Austin, US 5 21

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