Integrated photonic semiconductor devices and methods for making integrated photonic semiconductors devices
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 23, 2010
Grant Date -
Aug 27, 2009
app pub date -
Feb 22, 2008
filing date -
Feb 22, 2008
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photonic semiconductor device and method are provided that ensure that the surface of the device upon completion of the SAG process is planar, or at least substantially planar, such that performance of the subsequent processes is facilitated, thereby enabling higher manufacturing yield to be achieved. A photonic semiconductor device and method are also provided that ensure that the isolation region of the device will have high resistance and low capacitance, without requiring the placement of a thick dielectric material beneath each of the contact pads. Eliminating the need to place thick dielectric materials underneath the contact pads eliminates the risk that the contact pads will peel away from the assembly.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully