Compositions and methods for image development of conventional chemically amplified photoresists
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United States of America Patent
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Jan 19, 2010
Grant Date -
Jan 4, 2007
app pub date -
Feb 6, 2006
filing date -
Jan 28, 2005
priority date (Note) -
Expired
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Abstract
Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a neutral compound.
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