GaN laser with refractory metal ELOG masks for intracavity contact
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United States of America Patent
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Dec 29, 2009
Grant Date -
Mar 15, 2007
app pub date -
Sep 9, 2005
filing date -
Sep 9, 2005
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Abstract
Refractory metal ELOG mask are used for GaN based VCSELs and edge emitter structures to serve as intracavity contacts. In these structures the refractory metal ELOG masks serve both as ohmic contact metals as well as masks for ELOG.
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